SavannahTM G2 aLD SySTeM

Savannah G2 ALD System
TM
www.CambridgeNanoTechALD.com
Produces
the Most Sophisticated Films Available
With a number of leading edge options, the Savannah G2 can deliver
the largest variety of films of any Thermal ALD system.
ALD Films
Ultratech scientists continuously add to the list of standard ALD recipes.
Contact us for your specific needs.
• Oxides: Al2O3, HfO, La2O3, SIO2, TiO2, ZnO, ZrO2, Ta2O,
In2O3, SnO2, Fe2O3, MnOx, Nb2O5, MgO, Er2O3, WOx,
MoO3, V2O3
Savannah G2 ALD system
Featuring
• In-Situ Ellipsometry
• In-Situ QCM
• S elf Assembling
• Doped Oxides: AZO, ATO, ITO
• Nitrides: WN, Hf3N4, Zr3N4, AIN, TiN, NbNx
• Metals: Ru, Pt, W, Ni, Fe, Co
• Sulfides: ZnS
• Organics SAMS and MLD: FOTS, FDTS, Thiols
Sophisticated Dual Operation Controls
Monolayers
-Second Cycle
• 2
Times
• Integrated Ozone
• L ow Vapor Pressure
Deposition
atch Processing
• B
love Box
• G
Integration
• And More!
Easy to use recipe driven Graphical User Interface (GUI) that allows users
to run either Thermal or Self Assembling Monolayer ALD processes
Savannah G2 Technical Specifications
SYSTEM SPECIFICATIONS
Substrate size
Savannah S100: up to 100 mm
Savannah S200: up to 200 mm
Dimensions (w x d x h)
Savannah S100: 585 x 560 x 980 mm
Savanzcnah S300: up to 300 mm
Savannah S200: 585 x 560 x 980 mm
Cabinet
Steel with white powder coat paint with
removable panels and lockable precursor door.
Savannah S300: 686 x 560 x 980mm
Operational Modes
Continuous Mode™ (high speed) or Exposure Mode™ (ultra-high aspect ratio)
Controls LabVIEW™, Windows™ 7, Lenovo Laptop, USB control
S200: RT - 350 °C
Deposition Uniformity (Al2O3) <1% (1σ)
Vacuum Pump
Alcatel 2021C2 – 14.6 CFM
Compliance
CE, TUV, FCC
Power
115 VAC or 220 VAC,1500 W (excluding pump)
Maximum Substrate Temperature
S100: RT - 400 °C
S300: RT - 350 °C
Cycle Time
<2 seconds per cycle with Al2O3 at 200 °C
Compatibility Clean room class 100 compatible
PRECURSOR DELIVERY SYSTEM
Ports
Valves
Precursor Cylinders
Carrier/Venting Gas
OPTIONS
2 lines standard, up to 6 lines available. Each line accommodates solid, liquid
and gas precursors and is independently heated up to 200 °C
Industry standard high speed ALD valves with 10 msec response time
Individually heated 50 ml stainless steel cylinders, optional
larger cylinders available
N2 mass flow controlled,100 SCCM
LVPD System
Low Vapor Pressure Delivery system
Batch and 3D objects
Dome lid with wafer cassette or large objects
In-Situ Ellipsometry
For real time ellipsometry
Ozone Generator
Glove box Interface
Integrated self contained ozone solution
Integrated to allow direct loading from within a glove box
In-Situ Quartz Crystal MicroBalance
For real time QCM
Particle Coating
Allows for coating of particles
Self Assembling Monolayers (SAMs)
For organic surface functionalization
130 Turner Street, Building 2, Waltham, MA. 02453
• 781-907-8900 • [email protected]

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