F R A U N H O F E R - I N S T I T U T EF Ü FO R RE LE EL K EC TT RR OO NN E NBSETARM A HALN- DU N P LDA PS LMAAS M T EACT H EC NH ON LO I KG FYE FP E P 1 1 1 Roll-to-roll lab coater for PVD technologies‘ development 2 Hollow cathode arc-activated deposition by boat evaporation 3 Electron beam source Contact person in Japan Dr. Koichi Suzuki SurFtech Transnational Co., Ltd. 510, Spacia Sangenchaya Nibankan 2-14-6, Taishido, Setagaya-ku Tokyo, 154-0004, Japan Phone +81 3-5433-1220 [email protected] 2 2 EXPLORE THE FUTURE OF VACUUM WEB COATING HAD-LABCOATERS FOR PLASMA-ACTIVATED HIGH-RATE DEPOSITION Economic vacuum processes for the high- Electron beam sources of axial type provide rate coating of polymer films are required the highest coating rates among the vari- by almost all industry sectors. Typical ap- ous PVD technologies and simultaneously plications are barrier layers for packaging produce deposited layers of excellent uni- materials and flexible electronic devices formity and purity. They can easily vaporize and can be extended to coatings for bat- even ferromagnetic and high-melting point teries and other innovative products. metalls, are well suitable for reactive deposition processes and for co-evaporation of With the industrial introduction of the different materials. Hollow-cathode-Activated Deposition The HAD-LabCoater is equipped with an (HAD) process, Fraunhofer FEP has inven- EB source which generates electrons by vir- ted a new class of vacuum web coating tue of a plasma discharge, and which is of technologies and tools. The plasma-acti- compact design, easy to maintain and favo- vation allows improved layer properties to rable in price and running costs. be realized, which so far were not achie- Utilizing hollow cathode arc discharges for vable with standard coating processes. plasma activation excels in its great flexibili- Plant manufacturer CREAVAC GmbH, Dresden, Germany Creative Vakuumbeschichtung 3 ty: Literally all vapors and gases can be ioniThe HAD-LabCoater represents a next- zed to a high degree and independently of generation R&D equipment that shall the peculiarities of the evaporation pro- help you to explore new applications for cess. HAD plasmas generate a considerable this technology and to find your own so- self-bias potential which is of great benefit lutions for innovative coating tasks. for coating isolating substrates. 4a 4b 6 5 Technical specifications of the HAD-LabCoater Potential applications These features are exemplary. We will gladly give you advice about the equipment which HAD-LabCoater ▪▪ conductive coatings for electronics base package ▪▪ insulating coatings maximum film / deposition width 240 mm / 200 mm film materials PET, BOPP, PLA, PI, PEN, Al-foil film thickness range 12 … 250 µm (< 50 µm for Al foil) coating drum power minimum temperature -20°C for P < 3 kW web speed 0.1 … 60 m / min web tension 10 … 300 N coating drum diameter 300 mm ▪▪ functional coatings for batteries Plasma activation of deposition ▪▪ improves layer adhesion ▪▪ controls microstructure of coatings ▪▪ promotes reactive PVD processes electron beam evaporator EB-source type / power / voltage crucible types ▪▪ barrier coatings for packaging applications and flexible electronics meets your requirements best. ▪▪ enables very high film growing rates EasyBeam (plasma EB-gun) / 30 kW / 30 kV water cooled copper, thermally insulated plasma activated high-rate deposition substrate graphite, alumina, boron nitride, ... boat evaporator optional (as alternative for EB evaporator) plasma source hollow cathode discharge current / voltage (cathode) ionized and excited particles plasma zone ionization excitation gas 250 A / 30 V neutral non-excited particles discharge current / voltage (booster anode) 150 A / 25 V working gases chemical reaction evaporator argon, nitrogen evaporation All parameters can be upgraded according to customers‘ demands. In addition, we can offer advanced solutions for the vacuum system, the pre-treatment, monitoring, and MF BIAS supply. Scheme of roll-to-roll plasma-activated high-rate deposition processes Our offer ▪▪ laboratory roll-to-roll machine with key components and coating technologies (plasma source, electron beam source) and substrate hollow cathode drum substrate hollow cathode drum dense plasma dense plasma vapor stream vapor stream options for various extensions ▪▪ support of R&D projects and key components delivery for a later industrial transfer of results 4 A chromium coating deposited electron gun onto polymer webs a) without plasma assistance b) activated by HAD process. boat evaporator crucible 5 Boat evaporator with wire feed 6 EB evaporator with water-cooled copper crucible and hollow cathodes © 2012 FRAUNHOFER FEP – V 2.0
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