Journal of the Ceramic Society of Japan
Paper
112 [11] 599–603 (2004)
^ó‡OGLV}‰“vðp¢½y‹qh|ŠV‰U“Éæé
VŠJ–ŒÌ`¬
·ÀNOEc†üEÁ¡çqEi¡LFÞ
_Þì§YÆZp‡¤†ŠC243–0435 _Þì§CV¼sº¡ò 705–1
Þ
(L)R“^~l[V‡“ER“g[‹ET[rXC229–1134 _Þ짊ʹsºãò 529–3
Formation of Silica Coatings from Perhydropolysilazane Using
Vacuum Ultraviolet Excimer Lamp
Yasuhiro NAGANUMA, Satomi TANAKA, Chihiro KATO and Toyohiko SHINDOÞ
Kanagawa Industrial Technology Research Institute, 705–1, Shimo­imaizumi, Ebina­shi, Kanagawa
Þ
Contamination Control Services, 529–3, Shimokuzawa, Sagamihara­shi, Kanagawa 229–1134
243–0435
Silica coatings have been prepared by the spin­coating technique with the 172 nm vacuum ultraviolet (VUV) ir­
radiation using a Xe2Þexcimer lamp. Perhydropolysilazane was used as a precursor. The chemical states, compo­
sition and optical transmittance of VUV­irradiated films were investigated by Fourier transform infrared, X­ray
photoelectron, UV­visible absorption spectroscopies. The results showed that VUV irradiation was effective to
remove hydrogen and nitrogen from the coating film and to incorporate oxygen to the film, so that the film
transforms into silica. The effects of VUV treatment on the film were found to be dependent on oxygen concen­
tration in surrounding gas. It was suggested that the effect of oxidation reaction due to active oxygen species
and/or ozone is larger than that of the cleavage of a chemical bonding by photon energy.
[Received June 4, 2004; Accepted September 22, 2004]
Key­words : Perhydropolysilazane, Silica, Thin film, Spin­coating, Vacuum ultraviolet light, Excimer lamp
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Fig. 2. FT–IR spectra of spin­coated films dried, heat­treated and
VUV­irradiated. TH is heat treatment temperature. CO and D are oxy­
gen concentration and distance between the lamp window and the
sample, respectively.
ª©Á½D±êÍCi3)`(5)®É¦µ½ O(1Djâ O3 Éæé_
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Journal of the Ceramic Society of Japan
112 [11] 2004
601
Fig. 3. O1s, N1s and Si2p XPS spectra from spin­coated films heat­treated and VUV­irradiated. TH is heat treatment temperature. CO and D are
oxygen concentration and distance between the lamp window and the sample, respectively.
Fig. 4. XPS depth profiles of spin­coated films heat­treated and VUV­irradiated. TH is heat treatment temperature. CO and D are oxygen con­
centration and distance between the lamp window and the sample, respectively.
602
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Fig. 5. Optical transmittance spectra of spin­coated films heat­treat­
ed and VUV­irradiated. TH is heat treatment temperature. CO and D
are oxygen concentration and distance between the lamp window and
the sample, respectively.
Fig. 6. Calculated values of transmittance of vacuum ultraviolet
light as a function of distance with oxygen concentration (CO) of 2÷
and 20÷ by Eq. (6).
FT–IR ªè̋ʩçCD20 mm ÌðÌÆ«CCO2÷,
20÷ÌoûÌðÅVŠJÖÌ]»ªÏª³ê½Dµ©µCCO
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Journal of the Ceramic Society of Japan
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References
1)
2)
3)
4)
5)
6)
7)
8)
9)
Seyferth, D. and Wiseman, G. H., J. Am. Ceram. Soc., Vol.
67, pp. C132–C133 (1984).
Funayama, O., Arai, M., Tashiro, Y., Aoki, H., Suzuki, T.,
Tamura, K., Kaya, H., Nishi, H. and Isoda, T., J. Ceram. Soc.
Japan (Seramikkusu Ronbunshi), Vol. 98, pp. 104–107 (1990).
Matsuo, H. and Yamada, K., Convertech, No. 4, pp. 25–29
(1995) [in Japanese].
Shimizu, Y., Toso to Toryo, No. 569, pp. 27–33 (1997) [in
Japanese].
Kogelschatz, U., Eliasson, B. and Egli, W., Pure Appl. Chem.,
Vol. 71, pp. 1819–1828 (1999).
Inoue, K., Michimori, M., Okuyama, M. and Hamakawa, Y.,
Jpn. J. Appl. Phys., Vol. 26, pp. 805–811 (1987).
Murahara, M., Hyomen Kagaku, Vol. 20, pp. 407–413 (1998)
[in Japanese].
Hishinuma, N. and Yoshioka, M., Kogaku, Vol. 30, pp.
790–794 (2001) [in Japanese].
Nakamura, M., Tanaka, S., Naganuma, Y. and Kato, C.,
Hyomen Gijutu, Vol. 53, pp. 507–510 (2002) [in Japanese].
15)
16)
17)
18)
19)
20)
21)
22)
112 [11] 2004
603
Awazu, K. and Onuki, H., Appl. Phys. Lett., Vol. 69, pp.
482–484 (1996).
Awazu, K. and Onuki, H., J. Non­Cryst. Solids, Vol. 215, pp.
176–181 (1997).
Zhang, J. Y. and Boyd, I. W., Mater. Sci. Semicond. Process.,
Vol. 3, pp. 345–349 (2000).
Moulder, J. F., Stickle, W. F., Sobol, P. E. and Bomben, K.
D.,gHandbook of X­ray Photoelectron Spectroscopy,hEds. by
Chastain, J. and King, R. C., Jr., Physical Electronics Inc.,
Eden Prairie, MN (1995) pp. 238–238.
Ohki, Y. and Nagasawa, K., Oyo Buturi, Vol. 60, pp. 708–711
(1991) [in Japanese].
Ebihara, K.,gNew Glass Handbook,hMaruzen (1991) pp.
63–65 [in Japanese].
Kawazoe, H., gPractical Manual for Amorphous Siliceous
Materials,hSipec (1999) pp. 78–78 [in Japanese].
Kawazoe, H., gPractical Manual for Amorphous Siliceous
Materials,hSipec (1999) pp. 221–223 [in Japanese].
Baba, T., Tateishi, K., Funahashi, S., Sugihara, M., Takai, S.,
Imamura, K. and Nishii, J., Mitsubishi Densen Kogyo Jihou,
Vol. 100, pp. 84–88 (2003) [in Japanese].
Kagami, T. and Hayashi, A.,gProduct and Application of
High­Purity Silica,h CMC Shuppan (2002) pp. 10–13 [in
Japanese].
Oba, Y.,gThe Glass: Cleaning & Surface Treatment,hKindai
Henshusha (1983) pp. 226–236 [in Japanese].
Mizumachi, H. and Tobayama, M., gHyomenshorigijutu
Handbook,hNTS (2000) pp. 532–538 [in Japanese].
Mitsuyuki, Y., Hyomen Gijutu, Vol. 53, pp. 502–506 (2002)
[in Japanese].

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