PSROC 2015 Annual Meeting - AVS Taiwan Chapter Session Topic：New Developments in Atomic Layer Deposition Technology Date： Jan. 29, 2015 (Thu) Location：R104, Delta Building, National Tsing Hua University Time 13:30 – 14:00 14:00 – 14:10 14:10 – 15:00 Activities Registration Opening Ceremony Chair: Prof. Li-Chyong Chen Atomic Layer Deposition: From Fundamentals to Applications Prof. Stacey Bent Dept. o f Chemical Engineering 15:00 – 15:30 Stanford University, USA Pushing the ultimate CMOS and beyond Prof. Ming-Hwei Hong Dept. of Physics, National Taiwan University 15:30 – 16:00 Fabricating TiO 2 Nanotubes for Improved Photocatalysis Performance by Atomic Layer Deposition Prof. Tsong-Pyng Perng Dept. of Materials Science and Engineering National Tsing Hua University 16:00 – 16:30 16:30 – 17:00 Break Chair: Dr. Jiann-Shiun Kao Applications of atomic layer deposition on the high-K\metal gate stack, solar cells, and nanoplasmonics Prof. Miin-Jang Chen Dept. of Materials Science National Taiwan University 17:00 – 17:30 and Engineering Metal and Nitride Films Prepared by Using Atomic Layer Deposition Dr. Chi-Chung Kei Advanced Semiconductor Equipment Division Instrument Technology Research Center, NARLabs
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