KDC 40 4-CM DC ION SOURCE MANUAL Supplement for

KDC 40 4-CM DC ION SOURCE MANUAL
Supplement for
MICRODISHED™ MOLYBDENUM
ION OPTICS
Kaufman & Robinson, Inc.
1330 Blue Spruce Drive
Fort Collins, Colorado 80524
Tel: 970-495-0187, Fax: 970-484-9350
Internet: www.ionsources.com
Copyright © 2011 by Kaufman & Robinson, Inc.
All rights reserved. No part of this publication
may be reproduced without written permission.
CONTENTS
1
_______________________________________________________
CONTENTS
1 Safety.............................................................................................................1-1
2 Specifications.................................................................................................2-1
3 Performance ..................................................................................................3-1
3.1 Gas Flow ..........................................................................................3-1
3.2 Electron-Backstreaming Limit...........................................................3-1
3.3 Maximum Ion Beam Current ............................................................3-2
3.4 Ion Beam Profiles .............................................................................3-3
4 Maintenance ..................................................................................................4-1
4.1 The Need for Maintenance................................................................4-1
4.2 Disassembly.....................................................................................4-2
4.21 Remove ion optics nuts .......................................................4-2
4.22 Remove magnet assembly ..................................................4-2
4.23 Remove insulators and sputter shield..................................4-2
4.24 Remove screen-grid support ...............................................4-3
4.25
Remove screen grid ............................................................4-3
4.26
Remove accelerator ............................................................4-3
4.27 Remove accelerator-grid support ........................................4-3
4.3 Clean the ion-optics parts.................................................................4-3
4.31
Grids....................................................................................4-3
4.32
Grid supports .......................................................................4-4
4.33
Ion-optics support ................................................................4-4
4.4 Selection of Focusing or Divergent Configuration ............................4-4
4.5 Re-assembly of the Ion Optics .........................................................4-4
4.51
Ion-optics support ................................................................4-5
4.52 Replace the accelerator-grid support...................................4-5
4.53 Replace the accelerator grid................................................4-5
4.54 Install new ball insulators.....................................................4-6
4.55 Replace the screen grid.......................................................4-6
4.56 Replace the screen-grid support..........................................4-6
4.57 Replace sputter shield and 10-32 insulators........................4-6
4.58 Replace magnet assembly ..................................................4-6
4.59
Tighten ion-optics screws .....................................................4-7
4.6 Spares..............................................................................................4-7
5 Warranty ........................................................................................................5-1
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Copyright © 2008 by Kaufman & Robinson, Inc., 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
CONTENTS
2
_______________________________________________________
Figures
3-1 Variation in ion beam current for a variation in argon gas flow when the
discharge voltage, discharge current, beam voltage, and accelerator voltage
are held constant ........................................................................................3-5
3-2 Evaluation of the electron backstreaming limit for a 600 V beam. The
accel voltage is varied while the discharge voltage, discharge current, and
argon gas flow are held constant ................................................................3-6
3-3 MSD ion-beam profile at a beam voltage of 200 V, an accelerator voltage of
40 V, and an argon ion-beam current of 4.0 mA with a source to probe
distance of 6 inches. ..................................................................................3-7
3-4 MSD ion-beam profile at a beam voltage of 200 V, an accelerator voltage of
200 V, and an argon ion-beam current of 12 mA with a source to probe
distance of 6 inches. ..................................................................................3-8
3-5 MSD ion-beam profile at a beam voltage of 300 V, an accelerator voltage of
60 V, and an argon ion-beam current of 12 mA with a source to probe
distance of 6 inches. ..................................................................................3-9
3-6 MSD ion-beam profile at a beam voltage of 400 V, an accelerator voltage of
80 V, and an argon ion-beam current of 23 mA with a source to probe
distance of 6 inches. ................................................................................3-10
3-7 MSD ion-beam profile at a beam voltage of 500 V, an accelerator voltage of
100 V, and an argon ion-beam current of 33 mA with a source to probe
distance of 6 inches. ................................................................................3-11
3-8 MSD ion-beam profile at a beam voltage of 500 V, an accelerator voltage of
300 V, and an argon ion-beam current of 56 mA with a source to probe
distance of 6 inches. ................................................................................3-12
3-9 MSD ion-beam profile at a beam voltage of 600 V, an accelerator voltage of
120 V, and an argon ion-beam current of 46 mA with a source to probe
distance of 6 inches. ................................................................................3-13
3-10 MSD ion-beam profile at a beam voltage of 700 V, an accelerator voltage of
140 V, and an argon ion-beam current of 61 mA with a source to probe
distance of 6 inches................................................................................3-14
3-11 MSD ion-beam profile at a beam voltage of 800 V, an accelerator voltage of
160 V, and an argon ion-beam current of 78 mA with a source to probe
distance of 6 inches................................................................................3-15
3-12 MSD ion-beam profile at a beam voltage of 900 V, an accelerator voltage of
180 V, and an argon ion-beam current of 94 mA with a source to probe
distance of 6 inches................................................................................3-16
3-13 MSD ion-beam profile at a beam voltage of 1000 V, an accelerator voltage
of 200 V, and an argon ion-beam current of 113 mA with a source to probe
distance of 6 inches................................................................................3-17
3-14 MSD ion-beam profile at a beam voltage of 1000 V, an accelerator voltage
of 500 V, and an argon ion-beam current of 140 mA with a source to probe
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CONTENTS
3
_______________________________________________________
3-15
3-16
3-17
3-18
3-19
3-20
3-21
3-22
3-23
3-24
3-25
3-26
3-27
3-28
distance of 6 inches................................................................................3-18
MSD ion-beam profile at a beam voltage of 1100 V, an accelerator voltage
of 220 V, and an argon ion-beam current of 134 mA with a source to probe
distance of 6 inches................................................................................3-19
MSD ion-beam profile at a beam voltage of 1200 V, an accelerator voltage
of 240 V, and an argon ion-beam current of 138 mA with a source to probe
distance of 6 inches................................................................................3-20
MSF ion-beam profile at a beam voltage of 200 V, an accelerator voltage of
40 V, and an argon ion-beam current of 7.0 mA with a source to probe
distance of 6 inches................................................................................3-21
MSF ion-beam profile at a beam voltage of 200 V, an accelerator voltage of
200 V, and an argon ion-beam current of 18 mA with a source to probe
distance of 6 inches................................................................................3-22
MSF ion-beam profile at a beam voltage of 300 V, an accelerator voltage of
60 V, and an argon ion-beam current of 16 mA with a source to probe
distance of 6 inches................................................................................3-23
MSF ion-beam profile at a beam voltage of 400 V, an accelerator voltage of
80 V, and an argon ion-beam current of 25 mA with a source to probe
distance of 6 inches................................................................................3-24
MSF ion-beam profile at a beam voltage of 500 V, an accelerator voltage of
100 V, and an argon ion-beam current of 38 mA with a source to probe
distance of 6 inches................................................................................3-25
MSF ion-beam profile at a beam voltage of 500 V, an accelerator voltage of
300 V, and an argon ion-beam current of 58 mA with a source to probe
distance of 6 inches................................................................................3-26
MSF ion-beam profile at a beam voltage of 600 V, an accelerator voltage of
120 V, and an argon ion-beam current of 50 mA with a source to probe
distance of 6 inches................................................................................3-27
MSF ion-beam profile at a beam voltage of 700 V, an accelerator voltage of
140 V, and an argon ion-beam current of 62 mA with a source to probe
distance of 6 inches................................................................................3-28
MSF ion-beam profile at a beam voltage of 800 V, an accelerator voltage of
160 V, and an argon ion-beam current of 77 mA with a source to probe
distance of 6 inches................................................................................3-29
MSF ion-beam profile at a beam voltage of 900 V, an accelerator voltage of
180 V, and an argon ion-beam current of 91 mA with a source to probe
distance of 6 inches................................................................................3-30
MSF ion-beam profile at a beam voltage of 1000 V, an accelerator voltage
of 200 V, and an argon ion-beam current of 107 mA with a source to probe
distance of 6 inches................................................................................3-31
MSF ion-beam profile at a beam voltage of 1000 V, an accelerator voltage
of 500 V, and an argon ion-beam current of 137 mA with a source to probe
distance of 6 inches................................................................................3-32
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Copyright © 2008 by Kaufman & Robinson, Inc., 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
CONTENTS
4
_______________________________________________________
3-29 MSF ion-beam profile at a beam voltage of 1100 V, an accelerator voltage
of 220 V, and an argon ion-beam current of 123 mA with a source to probe
distance of 6 inches................................................................................3-33
3-30 MSF ion-beam profile at a beam voltage of 1200 V, an accelerator voltage
of 240 V, and an argon ion-beam current of 135 mA with a source to probe
distance of 6 inches................................................................................3-34
4-1 Microdished™ molybdenum ion optics removed from the KDC 40 Ion
Source. The ion optics are shown at the right with the magnet assembly
and anode attached. ...................................................................................4-8
4-2 Close-up view of one of three nuts that must be removed to disassemble
the ion optics...............................................................................................4-9
4-3 Ion optics after three 10-32 nuts have been removed and the magnet
assembly has been lifted off .....................................................................4-10
4-4 Insulators and sputter shield removed. The three rods shown standing
upright in the ion optics will not be present during disassembly, but are
used during re-assembly ..........................................................................4-11
4-5 Screen-grid support removed ...................................................................4-12
4-6 Screen grid removed ................................................................................4-13
4-7 Accelerator grid removed..........................................................................4-14
4-8 Accelerator-grid support removed.............................................................4-15
Table
Table 3-1. Maximum argon ion beam current for 4-cm Microdished™
molybdenum defocused ion optics.....................................................................3-3
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Copyright © 2008 by Kaufman & Robinson, Inc., 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
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SAFETY
1-1
_______________________________________________________
1 SAFETY
Only technically qualified personnel should install, maintain, and troubleshoot the
equipment described herein.
Troubleshooting and maintenance should be carried out only after grounding the
components to be worked on and assuring t hat power cannot be applied to those
components while working on them.
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Copyright © 2008 by Kaufman & Robinson, Inc., 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
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SPECIFICATIONS
2-1
_______________________________________________________
2 SPECIFICATIONS
The Kaufman & Robinson, Inc., KRI ® KDC 40 Ion Source is a gridded ion source
that uses a direct-current (dc) discharge to generate ions. It comes with a variety
of ion optics. Separate supplements to the manual for that source cover the
detailed performance of the different configurations of the ion optics. This is the
supplement for the 4-cm Microdished™ molybdenum ion optics.
Microdished™ molybdenum ion optics offer a thir d alternative to the established
options of dished m olybdenum ion optic s and pyrolytic graphite ion optics.
Microdished™ ion optics can be used to generate collimated, slightly focused, or
slightly divergent ion beams, roughly similar to the options available with pyrolytic
graphite ion optics. At the same ti me, they have t he ruggedness of dished
molybdenum ion optics. Bec ause they use a patented ( U.S. Patent 6,246,162)
elastic dishing technology, no dishing step is required during their fabrication and
they are comparatively economical to use.
These Microdished™ ion optics can be used to generate either a slightly focused
ion beam or a slightly divergent ion beam. This switch is accomplished by taking
the ion optics apart, turning ov er the a ccelerator-grid support, accelerator grid,
screen grid, and screen-grid support, and re-assembling the ion optics . (This
means that the screen-grid support becom es the accelerator-grid support, the
screen grid becomes the accelerator grid, etc.)
In both cases the mean deflec tion of a beamlet (the ions leaving a single
aperture) from the axial direction is about 5º. For low-divergence operation of the
ion source (usually found at slightly less than the ma ximum ion-beam current for
the beam and accel voltages us ed), the ions leaving a si ngle aperture typically
have a distribution range of about ±6º relati ve to the mean direction. This means
that the focusing in the slightly focused configuration will offset the normal growth
of a collimated beam up to a distance of about 20 cm from the ion source, after
which the beam diameter will grow more rapidly. This is also the configuration to
use if the maximum current density is desired on the axis of the ion beam.
The slightly divergent configurati on should be used
uniform coverage is desired.
when a broader, more
These ion optics can accelerate an ion beam with an argon ion current of more
than 113 mA at a beam voltage of 1000 V or more.
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PERFORMANCE
3-1
_______________________________________________________
3 PERFORMANCE
The experimental performance of different ion optics will vary slightly, due to
small differences in construction. Some of the variations may also be due to
normal errors in the various measurements, impurities present, or details of the
particular installation. Although KRI® personnel have taken great care to assure
reproducible performance of the ion optics, there may be some variations from
the performance described in this section.
The following is a more detailed description of the performance of the KDC 40
Ion Source when Microdished™ molybdenum ion optics are used. It should
supplement the more qualitative description in Sections 4.4 through 4.7 in the
manual for the KDC 40 Ion Source.
3.1 Gas Flow
Figure 3-1 shows the variation in ion beam current for a variation in argon gas
flow for several different beam voltages when the discharge voltage,
discharge current, and accelerator voltage are all held constant for each
beam voltage. The operation with the Microdished™ molybdenum ion optics
is considered typical for gas flow requirements of the KDC 40 Ion Source, so
that Fig. 3-1 is identical to Fig. 4-2 of the ion source manual.
As shown in Fig. 3-1, the optimum gas flow of argon ranges from about 4
sccm at low ion-beam currents to about 6 sccm at ion-beam currents of about
100 mA. For more information concerning optimum gas flow, please read
Section 4.4 of the ion source manual.
There is also some effect of the background pressure in the vacuum chamber
in which the ion source is installed, due to the backflow of neutrals through
the ion optics.
The data in Fig. 3-1 were obtained at a low background
pressure. The effect of background pressure tends to be small for small ion
sources, but Section 4.4 of the ion source manual describes the procedure for
obtaining data similar to that in Fig. 3-1 for the user’s vacuum chamber.
3.2 Electron-Backstreaming Limit
The accelerator grid (see Fig. 3-1 in the ion source manual) serves as a
barrier to neutralizing electrons, preventing them from flowing backward
through the ion optics and giving a false contribution to the indicated ion
beam current. Because the potential at the center of an accelerator-grid
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PERFORMANCE
3-2
_______________________________________________________
aperture is more positive than the accelerator potential, the accelerator grid
must be negative of ground to provide such a barrier.
A sample of the data used to evaluate the backstreaming limit is shown in Fig.
3-2. With the gas flow, discharge voltage, discharge current, and beam
voltage (600 V) all held constant, the magnitude of the negative accelerator
voltage is reduced. At first there is a slow reduction in indicated ion beam
current, because the reduction in negative accelerator voltage results in some
reduction in ion-extraction efficiency. As the accelerator grid approaches
ground (0 V), however, backstreaming electrons from the neutralizer start
flowing back through the ion optics. To avoid this false contribution to
indicated ion beam current, the accelerator should be negative of ground by
about 100 V or more.
To allow for small variations in installation,
instrumentation, and operating conditions, an accelerator voltage of 120 V is
recommended.
As described in Section 4.5 of the ion source manual, the backstreaming limit
has been found to depend almost entirely with the beam voltage. For the
Microdished™ molybdenum ion optics, a minimum accelerator voltage equal
to 20% of the beam voltage is recommended. For additional background
information on the electon-backstreaming limit, see Section 4.5 of the ion
source manual.
3.3 Maximum Ion Beam Current
The maximum ion beam current is the maximum value that can be obtained
without the direct impingement of energetic ions on the accelerator grid. This
maximum beam current is a function of beam and accelerator voltages and is
separate from the maximum power limit described in Section 4.3 of the ion
source manual. Depending on the operating condition, it is possible to have
the ion beam current limited by either the ion optics or the maximum
discharge-chamber power. For additional background material on the
maximum ion-beam current, see Section 4.6 of the ion source manual.
Table 3-1 gives the maximum argon ion beam currents for the 4-cm
Microdished™ ion optics over a range of ion beam voltages. The accelerator
voltages (negative of ground, as shown in Fig. 3-1 of the ion source manual)
are mostly at 20 percent of the beam voltages, as described in the preceding
section. The exception is at a beam voltage of 500 V, where an accelerator
voltage of 300 V is used. Careful comparison to the maximum beam currents
at +600, -120 and +700, -140 will show that increasing the negative
accelerator voltage will increase the maximum beam current, but not as much
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PERFORMANCE
3-3
_______________________________________________________
as increasing both.
Table 3-1. Maximum argon ion beam current for
4-cm Microdished™ molybdenum defocused ion optics.
_____________________________________________
Beam, V
Accel, V
Beam, mA
_____________________________________________
200
40
4
300
60
12
400
80
23
500
100
33
500
300
56
600
120
46
700
140
61
800
160
78
900
180
94
1000
200
113
1000
500
140
1100
220
134
_____________________________________________
As stated, these maximum ion-beam currents are for the working gas of
argon. Assuming that the discharge voltage is adjusted to minimize the
production of doubly charged ions, the maximum ion-beam currents for other
working gases should vary inversely as the square-root of the atomic weight
of the ion. For example, xenon has an atomic weight of 131.3, while argon
has an atomic weight of 39.95. While the maximum ion current for argon is
127 mA at +1000 and -200 V, the maximum ion current for xenon would be
expected to be about 70 mA at the same voltages.
For the diatomic gases of oxygen and nitrogen, the dominant ion species is
diatomic, and the calculation should be made on the basis of the atomic
weight of the diatomic ion.
3.4 Ion Beam Profiles
The ion-beam profiles for a variety of operating conditions and the defocused
configuration are shown in Figs. 3-3 through 3-16. The survey distance was
15 cm from the ion source.
The ion-beam profiles for a variety of operating conditions and the focused
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PERFORMANCE
3-4
_______________________________________________________
configuration are shown in Figs. 3-17 through 3-30. The survey distance was
15 cm from the ion source.
In selecting an operating condition, the user of the ion source is cautioned
against using larger than necessary accelerator voltages to increase the
maximum beam current at a given beam voltage. The ion beam tends to
diverge more at these larger accelerator voltages so that the gain in current
density at the target can be less than expected.
There can also be a contamination concern. Charge-exchange ions fall back
on the accelerator grid and cause some sputter contamination from that grid.
This contamination is small near the backstreaming limit, but can increase
greatly at large negative accelerator voltages. If the ion-source application
involved is sensitive to contamination, the user should be very careful about
increasing the accelerator voltage more than necessary.
These profiles are corrected for charge-exchange ions. Energetic ions can
pass near, and exchange an electron with a low-energy background neutral.
This results in a low-energy ion and an energetic neutral that can continue to
the target and do most, or all, of the processing that an energetic ion would
have done. (The loss of momentum is a much slower process than charge
exchange and is usually negligible at the background pressures of ≤0.5
milliTorr at which gridded ion sources are normally operated.1) If a screened
probe2 (which excludes charge-exchange ions) is used to check these
profiles, current densities slightly less than those shown in the profiles will be
obtained. If a planar probe2 is used (which collects the low-energy ions from
the surroundings, in addition to energetic ions), current densities slightly
greater than those shown in the profiles will be obtained.
Reference
1. MEAN FREE PATH TECH NOTE
2. J. R. Kahn, H. R. Kaufman, R. E. Nethery, R. S. Robinson, and C. M. Shonka,
"Low energy End-Hall Ion Source Characterization at Millitorr Pressures," 48th
Annual Technical Conference Proceedings of the Society of Vacuum Coaters,
pp. 17-22, 2005.
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PERFORMANCE
3-5
_______________________________________________________
120
Vb = 1000
Beam current, mA
100
Vb = 800
80
60
Vb = 600
40
Vb = 400
20
0
0
2
4
6
8
10
Gas flow, sccm
Fig. 3-1. Variation in ion beam current for a variation in argon gas flow when the
discharge voltage, discharge current, beam voltage, and accelerator voltage are
held constant.
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PERFORMANCE
3-6
_______________________________________________________
50
49
Vb
600
Beam Current, mA
48
47
46
45
44
43
42
41
40
0
100
200
300
400
Accelerator voltage, volts
Fig. 3-2. Evaluation of the electron backstreaming limit for a 600 V beam. The
accel voltage is varied while the discharge voltage, discharge current, and argon
gas flow are held constant.
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PERFORMANCE
3-7
_______________________________________________________
0.07
Vb I b
200 4.0
Ion current density, ji, mA/cm
2
0.06
0.05
0.04
0.03
0.02
0.01
0
0
2
4
6
8
10
12
r, cm
Fig. 3-3. MSD ion-beam profile at a beam voltage of 200 V, an accelerator
voltage of 40 V, and an argon ion-beam current of 4.0 mA with a source to probe
distance of 6 inches.
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PERFORMANCE
3-8
_______________________________________________________
0.14
Vb I b
200 12
Ion current density, ji, mA/cm
2
0.12
Va
-200
0.1
0.08
0.06
0.04
0.02
0
0
2
4
6
8
10
12
r, cm
Fig. 3-4. MSD ion-beam profile at a beam voltage of 200 V, an accelerator
voltage of 200 V, and an argon ion-beam current of 12 mA with a source to probe
distance of 6 inches.
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PERFORMANCE
3-9
_______________________________________________________
0.2
Vb I b
300 12
Ion current density, ji, mA/cm
2
0.18
0.16
0.14
0.12
0.1
0.08
0.06
0.04
0.02
0
0
2
4
6
8
10
12
r, cm
Fig. 3-5. MSD ion-beam profile at a beam voltage of 300 V, an accelerator
voltage of 60 V, and an argon ion-beam current of 12 mA with a source to probe
distance of 6 inches.
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PERFORMANCE
3-10
_______________________________________________________
0.4
Vb I b
400 23
Ion current density, ji, mA/cm
2
0.35
0.3
0.25
0.2
0.15
0.1
0.05
0
0
2
4
6
8
10
12
r, cm
Fig. 3-6. MSD ion-beam profile at a beam voltage of 400 V, an accelerator
voltage of 80 V, and an argon ion-beam current of 23 mA with a source to probe
distance of 6 inches.
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PERFORMANCE
3-11
_______________________________________________________
0.6
Vb Ib
500 33
Ion current density, ji, mA/cm
2
0.5
0.4
0.3
0.2
0.1
0
0
2
4
6
8
10
12
r, cm
Fig. 3-7. MSD ion-beam profile at a beam voltage of 500 V, an accelerator
voltage of 100 V, and an argon ion-beam current of 33 mA with a source to probe
distance of 6 inches
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PERFORMANCE
3-12
_______________________________________________________
0.7
Vb Ib
500 56
0.5
Va
-300
Ion current density, ji, mA/cm
2
0.6
0.4
0.3
0.2
0.1
0
0
2
4
6
8
10
12
14
16
r, cm
Fig. 3-8. MSD ion-beam profile at a beam voltage of 500 V, an accelerator
voltage of 300 V, and an argon ion-beam current of 56 mA with a source to probe
distance of 6 inches.
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PERFORMANCE
3-13
_______________________________________________________
1
Vb Ib
600 46
Ion current density, ji, mA/cm
2
0.9
0.8
0.7
0.6
0.5
0.4
0.3
0.2
0.1
0
0
2
4
6
8
10
12
r, cm
Fig. 3-9. MSD ion-beam profile at a beam voltage of 600 V, an accelerator
voltage of 120 V, and an argon ion-beam current of 46 mA with a source to probe
distance of 6 inches.
________________________________________________________________________
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Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
PERFORMANCE
3-14
_______________________________________________________
1
Vb Ib
700 61
Ion current density, ji, mA/cm
2
0.9
0.8
0.7
0.6
0.5
0.4
0.3
0.2
0.1
0
0
2
4
6
8
10
12
r, cm
Fig. 3-10. MSD ion-beam profile at a beam voltage of 700 V, an accelerator
voltage of 140 V, and an argon ion-beam current of 61 mA with a source to probe
distance of 6 inches.
________________________________________________________________________
Copyright © 2008 by Kaufman & Robinson, Inc., 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
PERFORMANCE
3-15
_______________________________________________________
1.4
Vb Ib
800 78
Ion current density, ji, mA/cm
2
1.2
1
0.8
0.6
0.4
0.2
0
0
2
4
6
8
10
12
r, cm
Fig. 3-11. MSD ion-beam profile at a beam voltage of 800 V, an accelerator
voltage of 160 V, and an argon ion-beam current of 78 mA with a source to probe
distance of 6 inches.
________________________________________________________________________
Copyright © 2008 by Kaufman & Robinson, Inc., 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
PERFORMANCE
3-16
_______________________________________________________
1.6
Vb Ib
900 94
Ion current density, ji, mA/cm
2
1.4
1.2
1
0.8
0.6
0.4
0.2
0
0
2
4
6
8
10
12
r, cm
Fig. 3-12. MSD ion-beam profile at a beam voltage of 900 V, an accelerator
voltage of 180 V, and an argon ion-beam current of 94 mA with a source to probe
distance of 6 inches.
________________________________________________________________________
Copyright © 2008 by Kaufman & Robinson, Inc., 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
PERFORMANCE
3-17
_______________________________________________________
1.8
V b Ib
1000 113
Ion current density, ji, mA/cm
2
1.6
1.4
1.2
1
0.8
0.6
0.4
0.2
0
0
2
4
6
8
10
12
r, cm
Fig. 3-13. MSD ion-beam profile at a beam voltage of 1000 V, an accelerator
voltage of 200 V, and an argon ion-beam current of 113 mA with a source to
probe distance of 6 inches.
________________________________________________________________________
Copyright © 2008 by Kaufman & Robinson, Inc., 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
PERFORMANCE
3-18
_______________________________________________________
2
V b Ib
1000 140
Ion current density, ji, mA/cm
2
1.8
1.6
Va
-500
1.4
1.2
1
0.8
0.6
0.4
0.2
0
0
5
10
15
r, cm
Fig. 3-14. MSD ion-beam profile at a beam voltage of 1000 V, an accelerator
voltage of 500 V, and an argon ion-beam current of 140 mA with a source to
probe distance of 6 inches.
________________________________________________________________________
Copyright © 2008 by Kaufman & Robinson, Inc., 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
PERFORMANCE
3-19
_______________________________________________________
Ion current density, ji, mA/cm
2
2.5
V b Ib
1100 134
2
1.5
1
0.5
0
0
2
4
6
8
10
12
r, cm
Fig. 3-15. MSD ion-beam profile at a beam voltage of 1100 V, an accelerator
voltage of 220 V, and an argon ion-beam current of 134 mA with a source to
probe distance of 6 inches.
________________________________________________________________________
Copyright © 2008 by Kaufman & Robinson, Inc., 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
PERFORMANCE
3-20
_______________________________________________________
Ion current density, ji, mA/cm
2
2.5
V b Ib
1200 138
2
1.5
1
0.5
0
0
2
4
6
8
10
12
r, cm
Fig. 3-16. MSD ion-beam profile at a beam voltage of 1200 V, an accelerator
voltage of 240 V, and an argon ion-beam current of 138 mA with a source to
probe distance of 6 inches.
________________________________________________________________________
Copyright © 2008 by Kaufman & Robinson, Inc., 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
PERFORMANCE
3-21
_______________________________________________________
0.18
Vb I b
200 7.0
Ion current density, ji, mA/cm
2
0.16
0.14
0.12
0.1
0.08
0.06
0.04
0.02
0
0
2
4
6
8
r, cm
Fig. 3-17. MSF ion-beam profile at a beam voltage of 200 V, an accelerator
voltage of 40 V, and an argon ion-beam current of 7.0 mA with a source to probe
distance of 6 inches.
________________________________________________________________________
Copyright © 2008 by Kaufman & Robinson, Inc., 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
PERFORMANCE
3-22
_______________________________________________________
0.3
Vb I b
200 18
Ion current density, ji, mA/cm
2
0.25
Va
-200
0.2
0.15
0.1
0.05
0
0
2
4
6
8
10
r, cm
Fig. 3-18. MSF ion-beam profile at a beam voltage of 200 V, an accelerator
voltage of 200 V, and an argon ion-beam current of 18 mA with a source to probe
distance of 6 inches.
________________________________________________________________________
Copyright © 2008 by Kaufman & Robinson, Inc., 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
PERFORMANCE
3-23
_______________________________________________________
0.5
Vb I b
300 16
Ion current density, ji, mA/cm
2
0.45
0.4
0.35
0.3
0.25
0.2
0.15
0.1
0.05
0
0
2
4
6
8
r, cm
Fig. 3-19. MSF ion-beam profile at a beam voltage of 300 V, an accelerator
voltage of 60 V, and an argon ion-beam current of 16 mA with a source to probe
distance of 6 inches.
________________________________________________________________________
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Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
PERFORMANCE
3-24
_______________________________________________________
0.9
Vb I b
400 25
Ion current density, ji, mA/cm
2
0.8
0.7
0.6
0.5
0.4
0.3
0.2
0.1
0
0
2
4
6
8
r, cm
Fig. 3-20. MSF ion-beam profile at a beam voltage of 400 V, an accelerator
voltage of 80 V, and an argon ion-beam current of 25 mA with a source to probe
distance of 6 inches.
________________________________________________________________________
Copyright © 2008 by Kaufman & Robinson, Inc., 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
PERFORMANCE
3-25
_______________________________________________________
1.4
Vb I b
500 38
Ion current density, ji, mA/cm
2
1.2
1
0.8
0.6
0.4
0.2
0
0
2
4
6
8
r, cm
Fig. 3-21. MSF ion-beam profile at a beam voltage of 500 V, an accelerator
voltage of 100 V, and an argon ion-beam current of 38 mA with a source to probe
distance of 6 inches.
________________________________________________________________________
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Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
PERFORMANCE
3-26
_______________________________________________________
1.4
Vb Ib
500 58
Ion current density, ji, mA/cm
2
1.2
Va
-300
1
0.8
0.6
0.4
0.2
0
0
2
4
6
8
10
r, cm
Fig. 3-22. MSF ion-beam profile at a beam voltage of 500 V, an accelerator
voltage of 300 V, and an argon ion-beam current of 58 mA with a source to probe
distance of 6 inches.
________________________________________________________________________
Copyright © 2008 by Kaufman & Robinson, Inc., 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
PERFORMANCE
3-27
_______________________________________________________
2
Vb I b
600 50
Ion current density, ji, mA/cm
2
1.8
1.6
1.4
1.2
1
0.8
0.6
0.4
0.2
0
0
2
4
6
8
r, cm
Fig. 3-23. MSF ion-beam profile at a beam voltage of 600 V, an accelerator
voltage of 120 V, and an argon ion-beam current of 50 mA with a source to probe
distance of 6 inches.
________________________________________________________________________
Copyright © 2008 by Kaufman & Robinson, Inc., 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
PERFORMANCE
3-28
_______________________________________________________
3
Vb I b
700 62
Ion current density, ji, mA/cm
2
2.5
2
1.5
1
0.5
0
0
2
4
6
8
r, cm
Fig. 3-24. MSF ion-beam profile at a beam voltage of 700 V, an accelerator
voltage of 140 V, and an argon ion-beam current of 62 mA with a source to probe
distance of 6 inches.
________________________________________________________________________
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Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
PERFORMANCE
3-29
_______________________________________________________
3.5
Vb I b
800 77
Ion current density, ji, mA/cm
2
3
2.5
2
1.5
1
0.5
0
0
2
4
6
8
r, cm
Fig. 3-25. MSF ion-beam profile at a beam voltage of 800 V, an accelerator
voltage of 160 V, and an argon ion-beam current of 77 mA with a source to probe
distance of 6 inches.
________________________________________________________________________
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Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
PERFORMANCE
3-30
_______________________________________________________
4.5
Vb I b
900 91
Ion current density, ji, mA/cm
2
4
3.5
3
2.5
2
1.5
1
0.5
0
0
2
4
6
8
r, cm
Fig. 3-26. MSF ion-beam profile at a beam voltage of 900 V, an accelerator
voltage of 180 V, and an argon ion-beam current of 91 mA with a source to probe
distance of 6 inches.
________________________________________________________________________
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Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
PERFORMANCE
3-31
_______________________________________________________
5
V b Ib
1000 107
Ion current density, ji, mA/cm
2
4.5
4
3.5
3
2.5
2
1.5
1
0.5
0
0
2
4
6
8
r, cm
Fig. 3-27. MSF ion-beam profile at a beam voltage of 1000 V, an accelerator
voltage of 200 V, and an argon ion-beam current of 107 mA with a source to
probe distance of 6 inches.
________________________________________________________________________
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Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
PERFORMANCE
3-32
_______________________________________________________
5
V b Ib
1000 137
Ion current density, ji, mA/cm
2
4.5
4
Va
-500
3.5
3
2.5
2
1.5
1
0.5
0
0
2
4
6
8
r, cm
Fig. 3-28. MSF ion-beam profile at a beam voltage of 1000 V, an accelerator
voltage of 500 V, and an argon ion-beam current of 137 mA with a source to
probe distance of 6 inches.
________________________________________________________________________
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Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
PERFORMANCE
3-33
_______________________________________________________
6
V b Ib
1100 123
Ion current density, ji, mA/cm
2
5
4
3
2
1
0
0
2
4
6
8
r, cm
Fig. 3-29. MSF ion-beam profile at a beam voltage of 1100 V, an accelerator
voltage of 220 V, and an argon ion-beam current of 123 mA with a source to
probe distance of 6 inches.
________________________________________________________________________
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Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
PERFORMANCE
3-34
_______________________________________________________
8
V b Ib
1200 135
Ion current density, ji, mA/cm
2
7
6
5
4
3
2
1
0
0
2
4
6
8
r, cm
Fig. 3-30. MSF ion-beam profile at a beam voltage of 1200 V, an accelerator
voltage of 240 V, and an argon ion-beam current of 135 mA with a source to
probe distance of 6 inches.
________________________________________________________________________
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Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
MAINTENANCE
4-1
_______________________________________________________
4 MAINTENANCE
Maintenance on the Microdished ™ molybdenum ion optics for the KRI ® KDC 40
Ion Source should be carried out in a clea n environment where the ion sourc e is
protected from accidental damage. Several things should be kept in mind to help
avoid maintenance problems.
These ion optics prov ide precise and repeatable alignm ent without an inher ently
imprecise manual alignment step. The maintenance instructions for the ion
optics are not difficult to fo llow, but it is important to follow them if you wish to
obtain the precision and repeatability of which these ion optics are capable.
Never tighten the nuts that hold the ion optics together without a torque
wrench. A torque wrench is supplied with the ion source.
The following should be used in place of Section 5.28 in the Manual for the KDC
40 Ion Source when Microdished ™ molybdenum ion optics are used on that ion
source.
4.1 The Need for Maintenance
It is recommended that the ion optics not be disassembled except to perform
required maintenance. During operatio n, very thin layers of conducting
material are deposited on the ball insula tors. This deposition, however, is on
portions of the insula tors that will cause no problems. Disassembling an d
assembling ion optics will result in the rota tion of some of the ball insulators.
This rotation will result in some of the depositions to be moved to where they
will cause arcing. Disassembling and reassembling ion optics that have been
operating normally can thus cause arcing problems where no arcing problems
were encountered previously.
If disassembly is necessary for some reason other than maintenance (suc
as changing from focused to divergent
configurations), it is strongly
recommended that all of the ball insulators be replaced.
h
Indication of need. Frequent arcs are observed in the ion optics, involving the
beam and accelerator supplies.
Contra-indication of need. T hese arcs are avoided or greatly reduced if a
longer discharge-chamber warmup is used, or if a gradual conditio ning to
higher beam and acc el voltages is used. (A warmup or gradual conditioning
may be helpful if the ion optics have been expos ed to atmosphere for a long
________________________________________________________________________
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MAINTENANCE
4-2
_______________________________________________________
time, are new, have recently under gone maintenance, or have been operat ed
for a long time at lower voltages. )
Maintenance. Carry out the following maintenance procedure.
4.2 Disassembly
4.21 Remove ion-optics nuts
The ion optics are shown in Fig. 4-1, together with the attached magnet
assembly. The anode may, or ma y not, be attached to the magnet
assembly, depending on the maintenance that has been carried out on the
rest of the ion source. There are alignment notches on the ion optics parts
that can serve as aids during re-assembly.
Three gold-plated small-pattern 10-32 nuts are removed first. T he use of
gold plating greatly reduces the likel ihood of seizing during disassembly.
One of these nuts is shown in F ig. 4-2. It is on one of the three 10-32X11/2 socket-head screws that go through t he ion optic s. To keep the ionoptics parts together while these
nuts are removed, the ion-optics
orientation shown in F igs. 4-1 and 4-2 (with the grids fa cing down) should
be maintained while they are disassemb led. This is done by sliding the
ion-optics assembly to the edge of a work surface, so that the head of one
of these screws is exposed from the bottom and can be rotated with a he x
wrench while the nut is held with an open end wrench. (An open end
wrench with the ends ground to fit in the magnet assembly is supplied with
the ion source.) This can be repeated with each nut and screw.
4.22 Remove magnet assembly
The removal of thes e nuts, as well as the helical lock was hers and
insulators under them, permits the magnet assembly to be removed. This
leaves the ion optics as shown in Fig. 4-3.
Place the magnet assembly and (if a ttached) the anode in a place wher e
they are pr otected from damage while maintenance is carried out on the
ion optics.
4.23 Remove insulators and sputter shield
Removal of the insulators and sputter shield leaves
shown in Fig. 4-4.
the ion optics as
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MAINTENANCE
4-3
_______________________________________________________
There are three rods with a diameter of 1.59 mm (1/16") extending upward
from the ion optics
in Fig. 4-4.
These rods are not needed for
disassembly, but are necessary during re-assembly, and will be discussed
in the sections on re-assembly.
4.24 Remove screen-grid support
When the screen-grid support is remov ed, Fig. 4-5, the screen grid is
exposed. Also expos ed are the twelve ball insulators that separ ate and
align the screen and accelerator grids.
4.25 Remove screen grid
Removing the screen grid, Fig. 4-6, fu lly exposes the six ins ulator balls
that were partially c overed in F ig. 4-5. The accelerator grid is also
esposed.
4.26 Remove accelerator grid
Removing the accelerator grid, Fig.
4-7, also removes the six ball
insulators that were resting directly on it. (The larger holes at the other s ix
balls permit them to remain on the exposed accelerator-grid support.)
4.27 Remove accelerator-grid support
Removing the accelerator-grid support, Fig. 4-8, leaves the ion-optics
support, three 10-32X1-1/2 screws, and three 10-32MK insulators.
4.3 Clean the Ion-Optics Parts
4.31 Grids
The preferred cleaning methods fo r screen and ac celerator grids are
chemical and ultrasonic. The chem ical method used will depend on the
type of deposits on t he grids. A rinse in deionized or distilled water is
recommended after cleaning.
If the grids are not going to be used i mmediately in an ion source, store
them where they will
be protected against
accidental damage or
atmospheric particulates.
Very light (low presure) grit blas ting may be used withi n the beam area to
remove adherent deposits, but it is
easy to destroy the grids with
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MAINTENANCE
4-4
_______________________________________________________
excessive pressure. For the areas of
the grids in c ontacts with their
supports, no cleaning should be nece ssary. Further, any roughening of
these areas can adv ersely affect the sliding motions due to thermal
expansion and contraction that must take place between the gr ids and
their supports.
4.32 Grid supports
For the areas of the screen-grid and a ccelerator-grid supports in contacts
with the gr ids, no cleaning s hould be necessary. There are the same
concerns about roughening t hese surfaces as t here are about the
matching surfaces on the grids. As long as these ar eas are protected
from damage while the re st of the supports are cleaned, there should be
no restriction on the type of cleaning used on the rest of the supports.
4.33 Ion-optics support
There is no restriction on the t ype of cleaning used on this part. If
preferred, the exterior surface of th is support, where most of the depos its
will occur, can be cleaned with conventional grit blasting.
4.4 Selection of Focusing or Divergent Configuration
The arrangement of parts in Sec tion 4.2 correspond to the diver gent-beam
configuration of the Microdished™ molybdenum optics. A simple way to check
which configuration is being used is to look at the three rods in Figs. 4-4
through 4-8. When the i on optics are oriented with the alignme nt notches
facing you, the divergent-beam configur ation will hav e rods at 12:00, 3:00,
and 6:00 o’clock. The focused-beam c onfiguration will have rods at 12:00,
6:00, and 9:00 o’clock.
4.5 Re-assembly of the Ion Optics
The re-assembly of the ion optics is generally the reverse of the disassembly,
but a more detailed description is nec essary to avoid problem s. Several
things should be kept in mind.
a. Use new insulators.
b. Keep the alignment notches in the same circumferential location.
c. Do not re-use helical stainles s-steel lock washers. They can become
compressed from use and their cost is negligible.
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MAINTENANCE
4-5
_______________________________________________________
d. When replac ing the three 10-32 nut s that hold the ion optics together,
use the torque wrench. Tighten all three first to 1 .7 cm-kg (1.5 inchpound), then tighten them to 3.5 cm-kg (3.0 inch-pound).
The reassembly below assum es that the divergent-beam configuration is
being re-assembled. For the focused c onfiguration, the alignment notches
should also be facing you, but there shoul d be a rod at 9.00 o’ clock, not 3:00
o’clock.
4.51 Ion-optics support
Place the ion-optics support on the work surface with the front surface (the
exterior surface when assembled on the ion source) facing down and the
alignment notch towards you.
Insert the three 10-32X1-1/2 soc ket head screws that will be used to hol d
the ion optics together.
Place three new 10-32MK insulators ov er the screws. The flat end of
these insulators should be face down and the lips facing up.
The assembly at this point should look like Fig. 4-8.
4.52 Replace the accelerator-grid support
Replace the accelerator grid support with the alignment notch faci ng you.
Insert the three rods. These rods
stay in place throughout the reassembly.
If the twelve holes to hold the ball ins ulators are not visible, you have the
accelerator-grid support upside down. If the holes for the ball insulators
are visible, but there is a hole for a rod at 9:00 o’cloc k, not 3:00 o’clock,
you have the screen-grid support, not the accelerator-grid support.
Except that the ball insulators hav
should look like Fig. 4-7.
e not been installed, the assembly
4.53 Replace the accelerator grid
Place the accelerator grid on t he previous assembly, making sure the
alignment notch is facing you.
The three holes for the rods in the accelerator grid should line up with the
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MAINTENANCE
4-6
_______________________________________________________
three holes in the accelerator-grid support, as shown in Fig. 4-6, for you to
replace the accelerator grid. If there is a hole at 9:00 o’c lock, not 3:00
o’clock, the grid may be upside down.
If you have the alignment notch facing you and the three holes for the rods
line up, the six large holes for ball insu lators in the accelerator grid should
line up with the six recessed holes in t he accelerator-grid support, so that
ball insulators can be dropped into these recesses.
(For the divergent-beam configuration, the recess ed holes in the
accelerator-grid support are near its outer diameter. For the focusedbeam configuration, they are near its inner diameter.)
4.54 Install new ball insulators
Install twelve new ball insulators. Six should rest on top of the accelerator
grid and six should be in the larger holes of the accelerator grid and rest
on the accelerator-grid support, as shown in Fig. 4-6.
4.55 Replace the screen grid
If the alignment notch is facing y ou and the three holes in the scr een grid
fit over the rods, the screen grid is in stalled correctly. At this point the
assembly should look like Fig. 4-5.
If the alignment notch is facing you, but there is a hole for a rod at 9:00
o’clock instead of 3:00 o’clock, the screen grid is upside down.
4.56 Replace the screen-grid support
The assembly should now appear as shown in Fig. 4-4.
4.57 Replace sputter shield and 10-32M insulators
Install the sputter shield with the alignm ent notch facing you. (If it doesn’t
face you, you won’t be able to install it over the three rods.)
Install three new 10-32M insulat ors over the three screws. The lips of the
insulators should ext end through the s putter shield into the screen-grid
support.
The assembly should now look like Fig. 4-3, except that the three rods are
still in place.
________________________________________________________________________
Copyright © 2008 by Kaufman & Robinson, Inc., 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
MAINTENANCE
4-7
_______________________________________________________
4.58 Replace magnet assembly
The magnet assembly is placed ov er the ion-optics assembly with the
three rods still in p lace. To av oid interference with th e rods, the anode
should be removed from the magnet a ssembly before the two assemblies
are brought together.
Place three new 10-32M insulators over the three screws in the ion optics .
The lips of these insulators should ext end down into the front ring of the
magnet assembly. Place the new 10- 32 split was hers on top of the
insulators.
Remove the rod nearest the alignment mark. Leave the other two rods in
place.
Install and finger-tighten the three gold-plated 10-32 nuts on the three ionoptics screws.
The two rods can now be removed. They served to keep the parts in
approximate alignment unt il tightening of the screw s can bring the parts
into final precise alignment.
The assembly should now look like Fig. 4-2.
4.59 Tighten ion-optics screws
Use the torque wrenc h to tighten all thr ee screws - failure to use a torque
wrench can dam age the ion opt ics. Place the assembly sideways on a
workbench or other hard surface. Hold th e nuts with a 3/8 “wrench and
tighten all three screws first to 1.7 c m-kg (1.5 inch-pound) with the torque
wrench, then tighten them to 3.5 cm-kg (3.0 inch-pound).
You can now replace the anode, holding it in place with a 10-32 nut on the
anode connection rod, as shown in Fig. 4-1.
The combined ion-optics/magnet/anode assembly is now ready to install in
the ion source as described in Secti on 5.29 of the manual for the KDC 40
Ion Source, to which this manual is a supplement
________________________________________________________________________
Copyright © 2008 by Kaufman & Robinson, Inc., 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
MAINTENANCE
4-8
_______________________________________________________
4.6 Spares
Kits of spares are available from KRI®.
Ion-optics maintenance kit:
Twelve ball insulators
Three 10-32MK insulators
Six 10-32M insulators
Three helical 10-32 lock washers
________________________________________________________________________
Copyright © 2008 by Kaufman & Robinson, Inc., 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
4-8
MAINTENANCE
Outer
shell
Anode
Anode
connection
rod
Magnet
assembly
Ion
optics
Fig. 4-1. Microdished™ molybdenum ion optics removed from the KDC 40 Ion
Source. The ion optics are shown at the right, with the magnet assembly and
anode attached.
Copyright © by Kaufman & Robinson, Inc. 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
MAINTENANCE
4-9
Gold-plated
10-32 nut
Fig. 4-2. Close-up view of one of three nuts that must be removed to
disassemble the ion optics.
Copyright © by Kaufman & Robinson, Inc. 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
4-10
MAINTENANCE
10-32 x 1-1/2”
socket-head
screws
Sputter
shield
10-32M
insulator
Fig. 4-3. Ion optics after three 10-32 nuts have been removed and the magnet
assembly has been lifted off.
Copyright © by Kaufman & Robinson, Inc. 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
4-11
MAINTENANCE
Rods used
during
re-assembly
Screen-grid
support
Fig. 4-4. Insulators and sputter shield removed. The three rods shown standing
upright in the ion optics will not be present during disassembly, but are used in
re-assembly.
Copyright © by Kaufman & Robinson, Inc. 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
4-12
MAINTENANCE
Screen
grid
Ball
insulators
Fig. 4-5.
Screen-grid support removed.
Copyright © by Kaufman & Robinson, Inc. 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
4-13
MAINTENANCE
Ball
insulators
Fig. 4-6.
Accelerator
grid
Screen grid removed.
Copyright © by Kaufman & Robinson, Inc. 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
4-14
MAINTENANCE
Accelerator
grid
support
Fig. 4-7.
Accelerator grid removed.
Copyright © by Kaufman & Robinson, Inc. 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
4-15
MAINTENANCE
10-32X1-1/2
socket-head screws
10-32MK
insulators
Ion-optics
support
Fig. 4-8. Accelerator-grid support removed, leaving the ion-optics support, three
10-32X1-1/2 screws, and three 10-32M insulators.
Copyright © by Kaufman & Robinson, Inc. 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com
WARRANTY
5-1
_______________________________________________________
5 WARRANTY
The Kaufman & Robinson, Inc., (KRI ®) KDC 40 Ion Source is warranted for one
year against manufacturer defects in materi als or workmanship. This year starts
with the date of shipment to the end user, provided in the event of OEM purchase
that date of shipment is not later than three months a fter the original shipment
from KRI®, Inc., and also prov ided the equipment has been operated and
maintained according to the pr ocedures described herein. KRI ® will service and
at its option repair or replace def ective parts, free of charge during the one-year
warranty period, at the KRI ® facility. This warranty ex cludes failures or defects
resulting from misuse or unauthorized m odification. This warranty does not
cover expendable parts, which are as follows:
Cathode and neutralizer filaments
Ion-optics grids
Ball/alumina insulators
Gas-line isolator
This warranty supersedes all other warr anties expressed or implied. KRI ®
assumes no liab ility for damages or los s of production. Re port defects or
problems to KRI ® immediately. For return of equipment for repair, contact KRI ®
to arrange for a return materials authorizat ion (RMA) number prior to shipment of
the equipment to KRI® facilities.
For service or repair, contact KRI®:
Kaufmen & Robinson, Inc.
1306 Blue Spruce Dr., Unit A
Fort Collins, CO 80524
(970) 495-0187
(970) 484-9350 (FAX)
Please include the following infor mation relating to the defect and the item to be
returned:
Product
Serial number
Detailed description of problem
Date of purchase
Name of company with address and contact person
________________________________________________________________
Copyright © 2008 by Kaufman & Robinson, Inc., 1306 Blue Spruce Drive, Unit A, Fort Collins, CO 80524
Tel: 970-495-0187, Fax: 970-484-9350, Internet: www.ionsources.com