Presentation in PDF

Speeding on the Roadmap-The Future of
3D NAND Flash
A Materials Perspective
Mark Thirsk
Managing Partner
[email protected]
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Cost Modeling
– Client demand modeling
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Economic Drivers
Real Growth By Major Region
8
6
% Change
4
2
0
World
US
Asia-Pacific
Europe
Latin America
-2
-4
-6
History: IMF, US Bureau of Economic Analysis
Forecast: Hilltop Economics
2007
Hilltop Economics LLC
2008
2009
2010
2011
2012
2013
2014
2015
2016
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Econometric Semiconductor Forecast
Semiconductor MSI Outlook
2,800
SEMI MSI (June 14 Update)
SEMI MSI (ESF Q2 2014)
SEMI MSI
2,700
2,600
2,500
2,400
2,300
2,200
2,100
2,000
History: SEMI
Forecast: Hilltop Economics
1,900
ESF June 2014 Update
MSI
%Change
%Change vs prior year
III IV I
II III IV I
II III IV I
II III IV I
II III IV I
II III IV I
II III IV I
2009
2010
2011
2012
2013
2014
2015
2014Q1
2364
7.1%
2014Q2F
2014Q3F
2014Q4F
2015Q1F
2543
7.6%
2573
1.1%
2460
-4.3%
2461
0.0%
11.1%
6.4%
9.9%
11.4%
4.1%
ESF Q2 2014 (May 2014)
MSI
%Change
Hilltop Economics LLC
2012
9031
-0.1%
2013
9067
+0.4%
2016
2014
9929
9.5%
2015
10508
+5.8%
2016
11247
+7.0%
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Technology Roadmaps
Logic
2010
2015
2020
2025
2010
2015
2020
2025
2010
2015
2020
2025
HKMG
FDSOI
MG
MG - Ge PMOS
MG - III/V NMOS
New Technology
Volatile
DRAM
MRAM
Non Volatile
NAND - 2D
NAND - 3D
RRAM - 3D
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Global Materials Market
$20,000
millions
$15,000
$10,000
$5,000
$0
Spin On
PVD
Plating
Litho
Implant
Etch
CVD
CMP
Clean
ALD
2013
$352
$380
$132
$2,760
$86
$73
$1,421
$1,625
$1,733
$149
2014
$534
$457
$165
$3,482
$105
$97
$1,649
$1,741
$1,766
$196
2015
$576
$497
$193
$4,134
$109
$117
$1,815
$1,819
$1,885
$253
2016
$588
$526
$232
$5,112
$116
$140
$2,072
$1,927
$2,025
$837
2017
$591
$553
$259
$5,903
$124
$155
$2,253
$2,019
$2,158
$927
2018
$505
$569
$287
$6,352
$129
$161
$2,384
$2,112
$2,230
$1,113
2019
$497
$573
$320
$6,812
$132
$175
$2,524
$2,190
$2,192
$1,551
2020
$417
$557
$329
$6,884
$128
$175
$2,559
$2,245
$2,165
$1,732
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NAND Flash Roadmap
2Tb
Cost per Bit
1Tb
512Gb
128Gb
Density
64Gb
32Gb
2010
2015
2020
2025
NAND - 2D
NAND - 3D
RRAM - 3D
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Device Comparison
•
•
NAND-3D
– TCAT
– 32 nm uncontacted poly 1/2 pitch (nm)
– 24 Vertical cells
– High k dielectric
– Metal Control Gate
NAND-2D
– 16 nm uncontacted poly 1/2 pitch (nm)
– Charge trap planar NAND
– High k dielectric
– Metal Control Gate
Device Starts 2016 / MSI
NOR
RF
NAND-3D
Other
MPU
NAND-2D
DRAM
ASIC
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TCAT Structure
Oxide
Tungsten
Oxide
STI
TaN
High k dielectric
Oxide
Poly
Oxide
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Comparable Litho Strategies
3D
2D
EUV1
0
1
ArFi
4
8
ArF
7
12
KrF
35
19
Total
46
40
Mask Count
50
40
30
20
3D
2D
LELE
0
0
Double patterning
DP
0
7
Triple patterning
TP
0
0
Quadruple patterning
QP
0
0
Multi layer
ML
4
3
Litho Etch Litho Etch
10
0
3D
EUV1
2D
ArFi
ArF
KrF
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Strategic Cost Model 1303
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Full BOM
NAND-3D
Cost category
$M/yr
$/waf
NAND-2D
$/cm2
$M/yr
$/waf
$/cm2
Starting wafer
$25.92
$80.00
$0.113
$25.92
$80.00
$0.113
Direct labor
$31.18
$96.23
$0.136
$27.11
$83.68
$0.118
Depreciation
$400.15
$1,235.03
$1.747
$495.66
$1,529.82
$2.164
Equipment maintenance
$91.98
$283.89
$0.402
$116.39
$359.24
$0.508
Indirect labor
$60.28
$186.05
$0.263
$52.34
$161.54
$0.229
Facilities
$49.38
$152.41
$0.216
$46.89
$144.72
$0.205
Monitor wafers
$7.29
$22.51
$0.032
$4.94
$15.23
$0.022
Consumables
$81.62
$251.91
$0.356
$110.71
$341.70
$0.483
$690.70
$2,308.03
$3.02
$826.93
$2,715.93
$3.61
98.0%
98.0%
98.0%
98.0%
$2,355.13
$3.08
$2,770.81
$3.68
Total unyielded wafer cost
Wafer yield
Yielded wafer cost
18% Higher
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Material BOM
Category
3-D
2-D
$400
Wet etch chemicals
ALD
$56.66
$18.15
Bulk gases
$29.62
$25.34
Cleaning chemicals
$7.34
$7.79
Cleanroom and safety supplies
$8.91
$7.74
CMP consumables
$13.67
$10.15
CVD precursors
$33.10
$33.14
Etch gases
$1.43
$1.43
Implant sources
$1.50
$1.66
$62.36
$84.13
Plating chemicals
$1.05
$2.10
PVD targets
$3.97
$4.18
Quartzware
$5.49
$3.89
$26.31
$141.74
$0.48
$0.27
$251.91
$341.70
Lithography materials
Reticles
Wet etch chemicals
Total
$350
Reticles
Quartzware
$300
PVD targets
Plating chemicals
$250
Lithography materials
Implant sources
$200
Etch gases
CVD precursors
$150
CMP consumables
$100
Cleanroom and safety supplies
Cleaning chemicals
$50
Bulk gases
ALD
$0
3-D
2-D
36% higher
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Bit Density
NAND 3D
NAND 2D
Cell Type
Charge Trap
Floating Gate
Dielectric
High k
High k
?
2-4
6F² / 24 = 0.25 F²
4F²
32
16
Bits / cm²
3.91E+11
9.77E+10
4 X more dense
Cost per bit
$7.73E-12
$3.70E-11
21% total cost
Bits per Cell
Cell Size
M1 ½ Pitch / nm
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