CSI VIXEL-320 Specifications July 2014 Wet Oxidation System for VCSEL Fabrication VIXEL-320 is a stand-alone lateral wet oxidation system intended for the fabrication of Vertical Cavity Surface Emitting Lasers. It is an atmosphericpressure oxidation system with in-situ monitoring of oxide aperture formation. It accommodates single wafers of up to 150mm (6″) in diameter. The user selects system parameters (N2 flow, water temperature), and oxidation parameters (time, chamber temperature). Maximum allowed wafer temperature is 500ºC. Typical oxidation temperature range is ~ 380-440 ºC. In-situ oxidation monitoring is done by an infrared optical microscope that is focused on VCSELs or test structures. Typically, the oxidation duration is selected as an upper limit in the software, while the operator monitors the oxidation progress. The process stops either by the operator when the desired aperture size is achieved, or by the system once the maximum duration is reached. Sysem installations are currently limited to the United States. International installations will be avialable in the first quater of 2015. For additional information please contact [email protected] VIXEL-320’s user interface shows system parameters and session information including a live image of the aperture size. All session information may be stored for future reference. CSI California Scientific, Inc. 830 Stewart Drive, Sunnyvale, CA 94085. TEL: (408) 236-2035 www.californiascientific.com System Specifications: Parameter Wafer Size Oxidation Rate Temperature Range Temperature Uniformity Oxidation Uniformity Heating Rate Cooling Rate Oxidation Start/Stop Lag Maximum Throughput System Dimensions Length Width Height System Weight Min Typ 0.5-1.0 420 Max Unit Comment 150 mm Up to 6″ Typical, Recommended 500 µm/min ºC ºC ± 2.5 ± 0.5 1 1 12 1 µm ºC/s ºC/s s Wafer/hr 36/91 24/61 53/135 90/200 in/cm in/cm in/cm Kg/lb Installation Requirements: • 110V and 220V electrical outlets • High purity house or bottled dry nitrogen • DI water line • Low volume exhaust Over a 150mm diameter wafer Typical, depends on many factors Recommended Rate Average, down to 200ºC < 0.2µm w/o compensation Limited by temperature ramping California Scientific manufactures optoelectronic fabrication and test equipment for the scientific community. CSI California Scientific, Inc. 830 Stewart Drive, Sunnyvale, CA 94085. TEL: (408) 236-2035 www.californiascientific.com