ᩍ㣴Ꮫ⛉ (⮬↛◊✲ㅮᗙ) ㎷ᒸ ᙉ 䝣䜷䝖䜽䝻䝭䝑䜽⭷⾲㠃䛻䛚䛡䜛 㔠ᒓ╔㑅ᢥᛶ 㑅ᢥⓗ㔠ᒓ╔䛾ཎ⌮䛸ᣑᙇᛶ 㞳⬺ ᰾ᙧᡂ ᾘⰍ≧ែ䠙 పTg䠄䡚ᐊ ⛬ᗘ䠅≧ែ ╔Ⰽ≧ែ䠙 㧗Tg≧ែ 䝣䜷䝖䜽䝻䝭䝑䜽䞉䝆䜰䝸䞊䝹䜶䝔䞁䛾㔠ᒓ╔㑅ᢥᛶ䛾Ⓨぢ ⣸እග↷ᑕ䛻䜘䜚↓Ⰽĺ㟷Ⰽ䛻ኚ䛥䛫䜛䛸䚸Ⰽ䛾䛴䛔䛶䛔䜛䛸 䛣䜝䛻┿✵╔䛻䜘䜚㔠ᒓ䛜ሁ✚䚸↓Ⰽ㒊ศ䛻ሁ✚䛧䛺䛔⌧㇟ Y. Sesumi, T. Tsujioka et al., Bull. Chem. Soc. Jpn., 83 (2010) 756 T. Tsujioka, M. Dohi., Appl. Phys. Express, 5 (2012) 041603 㔠ᒓ╔䛾╔㏿ᗘ䜔ᇶᯈ ᗘ䜢ㄪᩚ䛩䜛䛣䛸䛷䚸ᵝ䚻䛺㔠ᒓ✀䛷Ⓨ⌧䚹 㔠ᒓ╔㑅ᢥᛶ䛾ᛂ⏝ UV DAE layer Metal vapor Flattened Grating substrate T. Tsujioka, N. Matsui, Opt. Lett., 36 (2011) 3648 ගᏛ⣲Ꮚ䠄ᅇᢡ᱁Ꮚ䠅䜈䛾ᛂ⏝ 㑅ᢥⓗ㔠ᒓ╔ᢏ⾡䛸⾲㠃ᖹᆠຠᯝ䜢⤌䜏ྜ䜟䛫䛶䚸㏱ 㐣ග䛸ᑕග䛷␗䛺䜛ᅇᢡ䜢♧䛩ከᶵ⬟ᅇᢡ᱁Ꮚ䜢ᵓᡂ䛩 䜛䛣䛸䛜䛷䛝䜛䚹 DAE vapor deposition UV irradiation Uncolored line formation by red laser scanning Colored line formation by violet laser scanning Pb vapor deposition T. Tsujioka, N. Matsui, Opt. Lett., 37 (2011) 70 ╔㑅ᢥᛶ䛸䝣䜷䝖䜽䝻䝭䝈䝮䜢⏝䛔䛯 ᭩䛝䛘ྍ⬟䛺ከᶵ⬟ᅇᢡ᱁Ꮚ Undeposition for various metal species on PDMS Deposition rate Mg 0.01 0.1 1 Stamping PDMS 10 100 Mg evaporation Pb Ca Rd: 33 nm/s Glass substrate Rd: 20 nm/s Mn Sn Rd: 10 nm/s Rd: 4.5 nm/s Rd: 1.5 nm/s Al Ga Red laser scanning trajectory In Red laser scanning trajectory Violet laser scanning trajectory Ge [nm/s] Rd: 40 nm/s Rd: 4 nm/s Rd: 0.01 nm/s Rd: 10 nm/s Rd: 0.1 nm/s Rd: 1.0 nm/s Film thickness:50䡚150 nm Cathode pattern 200Pm Current [PA] 20Pm 400 350 300 250 200 150 100 50 0 -50 0 0.5 1 1.5 2 2.5 3 3.5 4 Voltage [V] Pb deposited area T. Tsujioka, M. Dohi., Appl. Phys. Express, 5 (2012) 041603 䝺䞊䝄䞊㉮ᰝ䛻䜘䜛Pb䝟䝍䞊䞁ᙧᡂ䛸䚸ᚤ⣽ⷧ⭷䝠䝳䞊䝈 Emission pattern T. Tsujioka, K. Tsuji., Appl. Phys. Express, 5 (2012) 021601 㧗ศᏊ䝟䝍䞊䞁䜢⏝䛔䛯㑅ᢥⓗ㔠ᒓ╔ᢏ⾡䛾 ᭷ᶵEL⣲Ꮚ䛾㝜ᴟ䝟䝍䞊䝙䞁䜾䜈䛾ᛂ⏝
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