Printing
Lithography
李元堯 Yuan-Yao Li
中正大學 化工系
Department of Chemical Engineering
National Chung-Cheng University
1
Printing Lithography
印章 Æ蓋印 Æ圖形
Microcontact Printing
(soft printing)
Imprint Technique
李元堯 中正大學 化工系 YuanYuan-Yao Li, Chem. Eng., CCU
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2.2.2 Microcontact
Printing
李元堯 YuanYuan-Yao Li
中正大學 化工系
Department of Chemical Engineering
National ChungChung-Cheng University
3
A. Introduction
Microcontact printing Æ Stamping
Techniques
Pioneered by Whiteside’s Group
(Harvard Univ., 1992)
Patterns by microcontact printing
(self-assembled monolayers, SAM)
李元堯 中正大學 化工系 YuanYuan-Yao Li, Chem. Eng., CCU
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B. Principles – Processes
(a) Fabrication of master (by EBL or photolithography): silicon rubber
on a silicon wafer
(b) Molding: silicon rubber on the master. The high of the lamellae (厚
度) (the high of the stamp): 0.6 ~ 4 µm. (read p77 marked)
(c) Peeling: Silicon stamp is apart from mater (robber stamp)
(d) Inking: stamp with reagent solution (stamp is wetted by a cotton +
solution)
(e) Printing: Inked stamp contacted with substrate (spontaneously
adhesion + reaction Æ high flexibility of stamp) (ink: thiol group(硫
醇類), substrate: gold)
(f) Monolayer: height 2 nm, lateral details: 20-150 nm Æ thiol
molecules (reagent) on gold
(g) Further Processes
Adding: deposition
Removing: etching
Filling free surface with different functional end groups
李元堯 中正大學 化工系 YuanYuan-Yao Li, Chem. Eng., CCU
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Microcontact Printing
(a) Fabrication of
master (by
EBL/lithography)
(b) Molding
(c) Peeling
(d) Inking (reagent
solution)
(e) Printing
(f) Monolayer (2nm
high, lateral details;
20 nm -150nm)
resist
Silicon wafer
Silicon rubber (0.4~0.6µm)
Silicon Rubber Stamp
Reagent
Substrate
(g) Further process
(deposition, etching,
filling)
李元堯 中正大學 化工系 YuanYuan-Yao Li, Chem. Eng., CCU
monolayer
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B. Principles – Processes
李元堯 中正大學 化工系 YuanYuan-Yao Li, Chem. Eng., CCU
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C. Important Factors
clean substrate and stamp without
contamination (particle , scratch )
strong interaction between substrate
and reagent
a long carbon chain in reagent to obtain
a well ordered self-assembled
monolayers withstand further processing
李元堯 中正大學 化工系 YuanYuan-Yao Li, Chem. Eng., CCU
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D. Self-assembled monolayer
Reagent
Thiol 硫醇類
Silanes 矽烷類
Substrate
Gold, Silver,
Copper
Silicon Oxide
Carboxylic Acid Oxides
李元堯 中正大學 化工系 YuanYuan-Yao Li, Chem. Eng., CCU
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Images of Microcontact printing
60 nm, Macromolecules, 2000, 33, 3042-3049.
李元堯 中正大學 化工系 YuanYuan-Yao Li, Chem. Eng., CCU
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E. Advantages
Chemically selective processes at the
surface and interfaces
Relatively fast printing than patterning
by E-beam exposure (reagent &
substrate reaction very quick)
Resolution is better than
photolithography
Curve and rough surface can be printed
李元堯 中正大學 化工系 YuanYuan-Yao Li, Chem. Eng., CCU
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F. Problems
The limits of stamp reuse ~25 times
particles contamination of stamp &
substrate surface
The limits of materials : High quality
monolayers require good combination of
substrates and reagents
李元堯 中正大學 化工系 YuanYuan-Yao Li, Chem. Eng., CCU
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G. Applications
Patterns
– Submicro patterns over a large area
– Submicro / nanolithography ( Quantum dots )
Multilayering: IC Multilayer vertically inter
connections
Interfacial / Interactions (compared to other
printing techniques)
–
–
–
–
–
–
–
selective etching
selective adsorption
selective adhesion
activation of chemical reactions (catalysis)
production of selective (bio) sensors
controlled wettability (liquid)
control over a patternwise growth of cell (pattern 方向的生長)
李元堯 中正大學 化工系 YuanYuan-Yao Li, Chem. Eng., CCU
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G. Applications
Mass fabrication of microlenses (poor
wetttability) (表面張力)
Ink spherical droplets
Surface
Measurement of air humidity (controlled
wettability)
Patterned particle layer
– production of phosphor layer in TV screens)
– Defining chemically deposited metal film pattern on
glass (silver plated Xmas – tree balls)
李元堯 中正大學 化工系 YuanYuan-Yao Li, Chem. Eng., CCU
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Imprint Techniques
Definition
Processes
Applications
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A. Definition
The essence of the imprint
technique is that a reusable mold is
pressed hard into a thin
thermoplastic polymer film on a
substrate, so that polymeric
material is removed from the
imprinted regions
李元堯 中正大學 化工系 YuanYuan-Yao Li, Chem. Eng., CCU
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B. Processes
(polymer)
李元堯 中正大學 化工系 YuanYuan-Yao Li, Chem. Eng., CCU
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C. Applications
Nanoelectronics
– Imprint + Scanning Probe Lithography
– Imprint + high-voltage Electron beam
Lithography
李元堯 中正大學 化工系 YuanYuan-Yao Li, Chem. Eng., CCU
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Conclusions of
Microcontact Printing
Read the text
Replace long exposure time techniques
Interfacial properties Æ other applications
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